Daniel Pulsipher
Daniel Pulsipher is the Director of Plasma Coating Technology at HZO, where he originates and validates equipment and processes for current and future plasma coating needs. He obtained his BS/MS from Idaho State University and his PhD in Physical/Materials Chemistry from Colorado State University. He has four pending or granted patents in the plasma processing and additive manufacturing space.
Parylene CVD vs. ALD vs. PECVD: Here's What R&D Leaders Should Know
A side-by-side comparison of three thin film coating technologies for electronic applications. R&D product leaders like you and me drive innovation. We turn ideas and problems..